New Plasma Beauty Machine Fusion Plasma System
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New Plasma Beauty Machine Fusion Plasma System factory
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New Plasma Beauty Machine Fusion Plasma System manufacturers
New Plasma Beauty Machine Fusion Plasma System manufacturers
Plasma Beauty Machine thar Fusion Plasma System hmanga siam a ni
Multi-functional care: Device pakhat hian thil tam tak a buaipui a, chung zingah chuan acne enkawlna, fading dark spots, anti-wrinkle effects, pore minimizing, leh skin stabilization te pawh a tel.
Safe and non-invasive: Taksa hnathawh hian chemical allergy awm theihna a ti bo a; cold mode hian heat damage a veng a, enkawl nuam tak a ni.
Hrilhfiahna
Technical Parameters 1000 a ni.
Product Hrilhfiahna: Core Technology & Hnathawh dan
New Plasma Beauty Machine hi fusion plasma system a ni a, cold plasma leh warm plasma technology te chu platform pakhatah a dah khawm a ni. Argon emaw helium gas emaw ionizing hmangin, he device hian temperature range hrang hrang pahnih-ah plasma a siam chhuak a, pakhat hian therapeutic effect bik a nei vek a ni.
Thiltihtheihna bulpui ber: Fusion Plasma
Plasma vawt (30℃– 70℃): a ni.He mode hian near‐room temperature-ah hna a thawk a, a chhehvel tissue-te thermal damage thlen lovin anti‐bacterial leh anti‐inflammatory effects a pe chhuak a ni. Disinfection, inflammation control, leh cellular activity zawi zawia tihchak ngai dinhmun atan hman a ni.
Plasma lum (120℃– 400℃): a ni a, a chhungah hian a lum hle.He mode hian controlled thermal energy a siam a, chu chu dermis chhung thuk zawkah a lut a ni. Collagen leh elastin siamchhuahna a tichak a, vun tightening a tichak a, anti‐aging leh scar revision application atan tissue remodeling a pui bawk.
Therapeutic Effects a awm thei
He device hian a hnathawh laiin reactive oxygen leh nitrogen species a siam chhuak thin. Heng active molecule te hian vun nen an inzawm a, hetiang hian:
Vun chunglama bacteria leh virus awmte tihbo
Cellular metabolism a tichak a, regeneration a tichak bawk
Collagen leh elastin siam chhuahna tichaktu
Topical products te penetration tihchak
Hliam tihdam leh tissue siamthatna tur support
Probe Configuration a awm bawk
He system hian hmanna bik atana ruahman interchangeable probe pariat a keng tel a:
| Probe chi hrang hrang | Zat | Thiltih |
|---|---|---|
| Non‐invasive lu te | 5 | Vun harsatna nei enkawlna atan: vun natna, vun sensitive, seborrheic dermatitis, rosacea, leh pigmentation. Plasma lum tak hmanga pek chhuah; downtime a awm lo. |
| Meso microcrystal lu a ni | 2 | A thuk zawng chu 0.25mm a ni a; topical products nena hman a ni a, deep inflammation, cystic acne, pigmentation, acne scars, pores, fine lines, leh mit ngaihtuahna te tihziaawmna atan hman a ni. Damlo pakhat tan vawi khat hman; plasma lum leh vawt takah pek chhuah; downtime a awm lo. |
| Micro‐peeling lu a ni | 1 | Epidermal spot, pores lian, acne pit, stretch mark, leh keratosis pilaris te tan. Plasma lum taka pek chhuah; Ni 3–7 chhung dam leh hun chhung. |
A thatna pawimawh tak tak
Plasma lum leh vawt pahnih:Anti‐bacterial cold plasma leh collagen‐stimulating warm plasma te chu device pakhatah a dah khawm thin.
Probe thlan dan chi hrang hrang:Probe pariat chuan ngaihtuahna hrang hrang-inflammatory acne leh vun sensitive atanga deep scarring leh textural irregularities thlengin a sawifiah a ni.
Non‐invasive duhthlan tur:Probe panga chuan downtime awm lovin cold plasma a pe chhuak a, damlo sensitive leh damlote tan pawh a tha hle.
Product absorption tihchak: 1.1.Plasma hian vunah micro‐channel a siam a, chu chuan active ingredients te penetration a ti tha hle.
Scar leh wrinkle tihchangtlunna:Plasma lum hian collagen remodeling a tichak a, acne scars, surgical scars leh fine lines te tihziaawmna atan a pui a ni.
Lu vun leh sam hman dan: 1.1.Probe bikte hi dandruff, lu vun inflammation, leh hair follicle activation te hmachhawn turin siam a ni.
Antimicrobial hnathawh dan: 1.1.Cold plasma hian vunah bacteria load a tihtlem tha hle a, hei hian acne leh infected lesions tan a tangkai hle.
Settings siamrem theih a ni:Energy level hi damlo tolerance leh treatment area angin a siam theih a ni.
Technical lam thil chi hrang hrang
| Parameter a ni | A sawifiahna |
|---|---|
| Tunlai thiamna | Fusion plasma (a lum + lum) 1.1. |
| Plasma lum lum vawt | 30℃– 70℃thleng a ni |
| Plasma lumna lum tak | 120℃– 400℃thleng a ni |
| Gas chhuahna hmun a ni | Argon emaw helium emaw (ionized) emaw a ni thei. |
| Thuneihna | 42 W |
| Voltage a ni | 220V AC, 50 Hz a ni |
| Thunun | Valve control chu automatic a ni |
| Probes te pawh a tel | 8 a vaiin (5 non‐invasive, 2 meso microcrystal, 1 micro‐peeling) a ni. |
| Microcrystal thuk tak a ni | 0.25 mm (Meso lu) a ni. |
| Recovery hun chhung | Non‐invasive: engmah lo; Micro‐peeling: Ni 3–7 chhung a ni |
| Certification pek chhuah a ni | CE, ISO 13485 a ni |
| Warranty a awm bawk | Kum 2 (main unit) chhung atan; consumable parts te pawh a tel lo |
| Operating environment a ni | 23℃, boruak tha tak a awm thei |
Professional Application Scenario hrang hrang te
Plasma Beauty Machine thar hi clinical leh wellness setting hrang hrangah hman a ni a:
Medical aesthetics clinic hrang hrangte chu:Acne enkawl, scar revision, vun ti thar, leh wrinkle tihziaawm.
Dermatology hnathawh dan: 1.1.Inflammatory skin conditions, pigmentation disorders, leh post‐procedure recovery te enkawl dan.
Medi‐spa leh wellness center-te chu:Non‐invasive facial treatment, product infusion, leh lu vun hriselna programme te.
Plastic surgery tih dan tur: 1.1.Post‐operative scar management leh vun tihdam dan.
Sam siam thatna hmun hrang hrang:Scalp treatment te hi dandruff, inflammation, leh follicle stimulation te tan a ni.
A hmasa ber atan chuan:
Acne (active leh post‐acne scarring) 1.1.
Pigmentation lama harsatna nei te
Line te tak te leh wrinkles te
Vun laxity leh elasticity hloh
Pores lian tak tak a awm
Scarring (acne, surgery, kang) 1.1.
Vun natna sensitive leh inflammatory tak tak te
Lung natna (dandruff, seborrheic dermatitis) .
Enkawlna atanga chhuak: Beisei ang Results
| Indication a ni | Session pangngai (Typical Session) neih thin te | A rah chhuah beisei ang |
|---|---|---|
| Active acne a awm | Session 3–5 chhung neih a ni | Inflammation tihziaawmna; lesions tlem zawk; tihdam chak zawk |
| Acne hliam a awm | Session 4–6 chhung neih a ni | Skin texture a hrual zawk; scar thuk zawng a tlahniam |
| Line te tak te leh wrinkles te | Session 4–6 chhung neih a ni | Hmuh theiha tihtlem; vun elasticity a ti tha zawk |
| Pigmentation a ni | Session 3–5 chhung neih a ni | Vun rawng (evened skin tone) a ni a; a hring (fading) a, a hring (fading of spots). |
| Vun laxity a awm | Session 4–6 chhung neih a ni | Vun khauh zawk, nghet zawk |
| Lu vun dinhmun | Session 4–6 chhung neih a ni | Dandruff tihziaawmna; lu vun hriselna a tichangtlung |
Mimal vun dinhmun, enkawl tam dan, leh post‐care protocol zawm dan azirin result a inang lo.
Professional Feedback a ni
Cold plasma technology hmanga practitioner-te chuan hetiang hian an sawi:
Device pakhata plasma lum leh lum inthlak danglam theihna hian kan enkawlna kawng a tizau hle. Acne vei sensitive emaw inflamed emaw tan cold plasma kan hmang a, collagen stimulation mamawh tan warm plasma kan hmang bawk. Probe hrang hrang hian hmai hmun te tak te atanga taksa ngaihtuahna lian zawk thlengin kan enkawl thei a ni. - Aesthetic medicine lama thawk, United States-a mi a ni
Micro‐peeling head hi a bik takin acne pit nghet lo leh textural irregularities nei damlote tan a tangkai hle. Ni 3–7 chhunga dam leh hun chhung hi damlo tam zawk tan chuan enkawl theih a ni a, session tlemte chauh hnuah a result pawh a lang chiang hle. - Vun lam doctor, United Kingdom-ah a thawk a ni
Kan sam tlakchhamna programme-ah hian scalp probes te hi kan dah tel a ni. Dandruff leh lu vun natna vei damlote chuan session 3–4 hnuah hmasawnna an nei tih an sawi a, hun kal zelah follicle hriselna tha zawk kan hmu bawk. - Trichologist, Australia ramah a awm a
Thil siamtute hriatpuina: Benomi Electronics
Weifang Benomi Electronic Technology Co., Ltd. hian professional aesthetic equipment zirchianna, siamchhuah leh siamchhuahna kawngah kum tam tak chhung chu a specialise tawh a niKum 18 chhung a ni. China khawpui Weifang-ah headquarter neiin, ISO‐certified cleanroom facilities a enkawl a, controlled condition hnuaiah assembly neih a ni.
Quality Assurance neih theihna tur:
Thil siamna hmun: 1.1.Dust‐free cleanrooms hian high‐precision electronic systems tan component integrity vawng reng turin a pui thin
Regulatory zawm dan: 1.1.Products te hian an phur aCE certification pek a nileh a hnuaia siam an niISO 13485 a niquality enkawl dan tur ruahmanna siam a ni. Market hman tur atan FDA registration kalpui mek a ni
Delivery hmaa test neih dan:Unit tin hian thawn chhuah hmain functional testing an nei vek a; test record pawh dil theih a ni
Component atanga lak chhuah:Critical components te hi supplier din tawh atanga lak chhuah a ni
Post‐sale puihna: 1.1.Main unit-ah kum 2 chhung warranty a awm a; 24/7 multilingual technical support a awm bawk
Wholesale leh Distribution chungchang hriat tur
Order zat tlem ber:Lei duh tan unit 1 a awm a; volume‐based pricing a awm thei bawk
Customization duhthlan tur hrang hrang:Device leh home screen-a logo dah dan tur ruahmanna siam; interface tawng hman dan tur (interface language localization); probe branding tih a ni
Lead hun chhung: 1.1.Standard order te chu a chhungah an thawn chhuak thinNi 5–7 chhung a ni; customized order a ngai a niNi 15–30 chhung a ni
Thawnchhuak:Khawvel pumah thlawhna hmanga bungraw phurh (DHL, UPS, FedEx, ni 3–10) emaw, tuipui lama bungraw phur emaw hmanga volume order-a thawn chhuah; tracking pek a ni
Packaging siam dan: 1.1.Transport venhimna atan foam insert hmanga packaging secure rawh
Partner puihna:Installation kaihhruaina, remote training, marketing materials, leh technical consultation kalpui mek te pawh a tel
Zawhna Zawh fo thin
Q: Plasma lum leh plasma lum hi eng nge an danglamna?
A: Cold plasma (30–70℃) hi a anti‐bacterial leh anti‐inflammatory property avang hian thermal damage awm lovin hman a ni. Vun sensitive, active acne, leh condition-a enkawl nasat ngai tan a tha hle. Plasma lum (120–400℃) hian controlled heat a siam a, chu chuan collagen leh elastin siamna a tichak a, vun tightening, wrinkle reduction leh scar remodeling atan hman a ni.
Q: Enkawlna hi a hrehawm em?
A: Damlo tam zawk chuan plasma lum hmanga enkawlnaah hian tingling emaw warmth emaw angin an sawi. Cold plasma hi a tlangpuiin cool sensation anga ngaih a ni a, a nuam lo hle. Anesthesia hman a ngai lo.
Q: Recovery hun hi engzat nge ni?
A: Non‐invasive probes (cold plasma) tan chuan downtime a awm lo. Damlote chuan hna pangngai an thawk leh nghal thei a ni. Micro‐peeling head tan chuan ni 3–7 chhung a dam leh beisei a ni a, chutih chhung chuan vun chu a sen a, a hring deuh thei bawk.
Q: Session engzat nge mamawh tlangpui?
A: Session 3–6 chhung course hi indication tam zawkah chuan a awm fo a, a dinhmun leh enkawlna hmun a zirin kar 2–4 inkara ruahman a ni.
Q: Machine hi vun chi hrang hrangah hman theih a ni em?
A: Ni e. Plasma technology hian melanin absorption-ah a innghat lo va, vun chi hrang hrang tan a tha hle (Fitzpatrick I–VI).
Q: Engtin nge probe dik tak chu ka thlan theih ang?
A: Non‐invasive heads hi vun enkawl dan tlangpui leh inflammatory condition atan hman a ni. Meso microcrystal heads hi product infusion thuk zawk leh acne scars leh pigmentation targeted treatment atan a ni. Micro‐peeling head hi textural irregularities leh superficial lesions te tan a ni.
Q: System hian eng maintenance nge a mamawh?
A: Probes te hi hman apiangin puan nem, lint‐free hmangin fai takin dah thin ang che. Single‐use microcrystal heads chu damlo pakhat hnuah paih vek tur a ni. System hian standard cleaning tih loh chu routine maintenance a mamawh lo.
Q: Training i pe em?
A: Ni e. Basic operational training hi thil lei rualin a tel a, probe thlan, parameter siamrem, leh treatment protocol te a huam a ni. Online leh video hmanga training neih theih a ni.
Inbepawp
Technical specification, pricing zawhna, emaw product demonstration ruahman duh tan Benomi’s commercial office ah zawhfiah theih a ni. Chhanna hun tlangpui chu darkar 24–48 a ni.
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